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Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)

PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins

Semiconductor Process Materials|Semiconductor material: etc
Semiconductor Process Materials|Semiconductor material: etc

SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki

Hard Mask Fabrication (HMF) - NanoSearcher
Hard Mask Fabrication (HMF) - NanoSearcher

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

NIL_vs_NEP-768x604.png
NIL_vs_NEP-768x604.png

BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM

KR101484568B1 - High etch-resistant carbon hard mask condensasion polymer and anti-reflection hard mask composition including same, and pattern-forming method of semiconductor device using same - Google Patents
KR101484568B1 - High etch-resistant carbon hard mask condensasion polymer and anti-reflection hard mask composition including same, and pattern-forming method of semiconductor device using same - Google Patents

Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering

BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar

Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation

BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling

Microwaves101 | Photolithography 101
Microwaves101 | Photolithography 101

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano

Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect
Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect

Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Spin-on Dual Hard Mask Material | JSR Micro, Inc.

Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Etching with a hard mask - Plasma Etching - Texas Powerful Smart

In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)

Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar

New silicon hard mask material development for sub-5nm node
New silicon hard mask material development for sub-5nm node

Semiconductor Process Materials|Semiconductor material: etc
Semiconductor Process Materials|Semiconductor material: etc